ISL has a cleanroom class 100 for the further development and consolidation of its power semiconductor process capabilities from single chip to 100-mm wafer size.
Total floor space of 100 m2
- Laminar air flow system for air cleanlinessequivalent to ISO standards 5/6 (classes 100/1,000)
- Process cabins and equipment for wet chemistry, photolithography, layer deposition, and thermal treatment
- Supply system for technical grade and ultra-high purity grade gases
- Water de-ionisation and purification system (sub-micron grade)
- Wafer handling capabilities up to 4 inches in size