ISL has a cleanroom class 100 for the further development and consolidation of its power semiconductor process capabilities from single chip to 100-mm wafer size.

Technical features

Total floor space of 100 m2

  • Laminar air flow system for air cleanlinessequivalent to ISO standards 5/6 (classes 100/1,000)
  • Process cabins and equipment for wet chemistry, photolithography, layer deposition, and thermal treatment
  • Supply system for technical grade and ultra-high purity grade gases
  • Water de-ionisation and purification system (sub-micron grade)
  • Wafer handling capabilities up to 4 inches in size